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S. K. Banerjee
Also published under:
Affiliation
MMSTL, Freescale Semiconductor, Inc., USA
Topic
Acoustic Waves,Impedance,Insertion Loss,Matching Network,Surface Acoustic Wave,Transceiver Chip,Access Port,Assembly Operations,Assembly Process,Bond Wires,Boundary Element Method,Circuit Design,Complex Engineering,Conventional Packaging,Doping Profile,Dual Band,Electromagnetic Interaction,Electromagnetic Simulation,Filter Response,Filtration Performance,Finite Element Method,Form Factor,Gridding,Low-noise Amplifier,Main Resonance,Mixed-signal Design,One-dimensional Profiles,Output Filter,Parasite,Parasitic Capacitance,Parasitic Effects,Pass Band,Physical Design,Plastic Packaging,Pyroelectric,S-parameters,Semiconductor Chip,Si Layer,Simulated Response,Simulation Process,Substantial Levels,Successful Integration,TCAD Simulation,Validation Process,
Biography
Suman K. Banerjee received the B.Tech. degree in chemical engineering from the Indian Institute of Technology, Madras, India, in 1993, the M.S. and Ph.D. degrees in chemical engineering from the Massachusetts Institute of Technology, Cambridge, in 1994 and 1998 respectively, and the M.B.A. degree from the Arizona State University, Tempe, in 2003.
He is a Senior Staff Engineer in the Microwave and Mixed-Signal Technologies Laboratory in the Technology Solutions Organization of Freescale Semiconductor, Tempe, AZ. His current research interests are in the areas of design and optimization of high-frequency semiconductor devices for RF and mixed-signal applications through circuit, process, device, and electromagnetic simulation. Previously, he has worked on simulation of chemical mechanical polishing processes.
He is a Senior Staff Engineer in the Microwave and Mixed-Signal Technologies Laboratory in the Technology Solutions Organization of Freescale Semiconductor, Tempe, AZ. His current research interests are in the areas of design and optimization of high-frequency semiconductor devices for RF and mixed-signal applications through circuit, process, device, and electromagnetic simulation. Previously, he has worked on simulation of chemical mechanical polishing processes.