Keun Hwi Cho

Also published under:K. H. Cho, Keunhwi Cho

Affiliation

Samsung Electronics, Hwaseong, Korea

Topic

AI Techniques,Categorical Data,Channel Width,Charge Potential,Charge Trapping,Compact Model,Constant Mobility,Conventional Devices,Data Pre-processing,Data Preparation,Decision Tree,Design Techniques,Device Dimensions,Device Performance,Drain Current,Energy Levels,Excellent Agreement,Explainable Artificial Intelligence,Feature Classification,Feature Engineering,Gate Oxide,Gate Stack,Information Processing,Interface Trap,Interface Trap Density,Limitations Of Design,Machine Learning Framework,Machine Learning Models,Metal Gate,Metal Resistance,Mobility Model,Nanowire Structure,Numerical Simulations,Outlier Detection,Outlier Detection Methods,Planar Devices,Potential Calculator,Processing Conditions,Processing Steps,Random Forest,Read Operation,Recent Technologies,SHapley Additive exPlanations,Shapley Value,Silicon Nanowire Field-effect Transistors,Silicon Nanowires,Splitting Method,Surface Potential,TCAD Simulation,TiN Gate,

Biography

K. H. Cho photograph and biography are not available at the time of publication.