Chang Auck Choi

Also published under:Chang-Auck Choi

Affiliation

Advanced i-MEMS team, Electrical and Telecommunications Research Institute, South Korea

Topic

Analyte Concentration,Coplanar Waveguide,Detection Capability,Dry Air,Electrode,Gold Nanoparticles,Micro-electromechanical Systems Switch,Temperature Coefficient Of Resistance,Wet Etching,1st Layer,2D Materials,Acetic Acid,Active Area,Air Gas,Alloy Composition,Alloy Films,Amorphous Silicon,Antenna Ports,Antenna Switching,Atomic Force Microscopy,Atomic Layer Deposition,Au Nanoparticles,Average Surface Roughness,Bolometer,Buffered Oxide Etchant,CMOS Process,Capacitive Accelerometers,Changes In Capacity,Chip Size,Cirrhosis,Compact RF,Contact Resistance,Conventional Bulk,Conventional Process,Convex Area,Cost-effective Solution,Deposition Process,Diameter Of Nanoparticles,Discharge Process,Dry Etching,Effect Of Load,Electrochemical,Electronic Chips,Electronic Nose System,Electronic System,Electroplating,Equivalent Circuit,Etching,Ethanol Vapor,Expensive Process,

Biography

Chang-Auck Choi was born in Daegu, Korea, in 1954. He received the M.S. and Ph.D. degrees in electronic engineering from Kyungpook National University, Taegu, Korea, in 1988 and 1999, respectively.
Since 1980, he has been with the Electronics and Telecommunications Research Institute (ETRI), Daejeon, Korea, where he is involved with the development of MEMS devices and advanced semiconductor process technology. He is currently the Director of the IT-BT Technology Development Department, ETRI. His current research involves microoptoelectromechanical systems (MOEMS), semiconductor sensors, and bio-MEMS.