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Maxim Abashin
Also published under:M. Abashin
Affiliation
Department of Electrical & Computer Engineering, University of California, San Diego, CA
Topic
Finite-difference Time-domain,Finite-difference Time-domain Simulations,Au Film,Circular Hole,Enhancement Factor,Field Enhancement,Inverted Microscope,Local Field,Metal Film,Normal Incidence,Periodic Array,Scanning Near-field Optical Microscopy,Slit Width,Square Lattice,Surface-enhanced Raman Scattering,Absorption Coefficient,Addition Of Water,Aperture,Band Bending,Buffered Oxide Etchant,Built-in Electric Field,Centrosymmetry,Cross-sectional Measurements,Effective Refractive Index,Electric Permittivity,Electrical Permeability,Electro-optic Modulator,Electromagnetic Field,Far-field,Final Form,Focused Ion Beam Milling,Gap States,Grain Boundaries,Illumination Conditions,Illumination Mode,Intensities In The Absence,Interface Analysis,Light Wave,Line Profiles,Local Gradient,Magnetic Force,Metamaterial,Minority Carrier,Nanoscale Resolution,Near-field Optical Microscopy,Negative Deflection,Negative Refractive Index,Nonlinear Optical,Nonlinear Susceptibility,On-chip Devices,
Biography
Maxim Abashin received the M.S. degree in applied physics from the Moscow Institute of Physics and Technology, Dolgoprudny, Russia, in 2003 and the Ph.D. degree in photonics from the University of California, San Diego, CA, USA, in 2009.
He is an Expert in nanophotonics and near-field microscopy. He was with the National Institute of Standards and Technology, Gaithersburg, MD, USA, as a Postdoctoral Research Associate from 2009 to 2012.
He is an Expert in nanophotonics and near-field microscopy. He was with the National Institute of Standards and Technology, Gaithersburg, MD, USA, as a Postdoctoral Research Associate from 2009 to 2012.