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Christoph Ellert
Also published under:C. Ellert, Ch Ellert
Affiliation
Institute of Systems Engineering, University of Applied Sciences Western Switzerland Valais (HES-SO Valais-Wallis), Sion, Switzerland
Topic
Electrical Energy,Energy Management System,Operation Mode,Renewable Energy,Solar Panels,Atomic Layer Deposition,Average Type,Battery Power,Cauliflower,Central Line,Chemical Vapor Deposition,Commercial Buildings,Communication Systems,Component Of Layer,Composite Layer,Concentric Layers,Dc Bus Voltage,Dc Microgrid,Deposition Process,Different Types Of Models,Electric Power,Electric Railway,Electric Vehicles,Electric Vehicles Charging,Electrolyte,Energy Management,Energy Management Strategy,Energy Storage Systems,Energy-dispersive X-ray Spectroscopy,Film Thickness,Flywheel,Gas Flow,Gas Phase,Global Simulations,Green Hydrogen,Growth Rate,Heating, Ventilation, And Air Conditioning,Hematite Thin Films,High Power,Industrial Complex,Iron Atoms,Iron Content,Iron Oxide,Layer Thickness,Longitudinal Position,Loss Of Communication,Maximum Voltage,Mean Free Path,Mean Time To Failure,Microgrid,
Biography
Christoph Ellert received the Ph.D. degree in cluster physics, in optical spectroscopy of mass selected metal clusters from the University of Freiburg, Freiburg im Breisgau, Germany, in 1995.
From 1996 to 1999, he pursued fundamental research at the National Research Council Canada, Ottawa, ON, Canada, and the CEA in Grenoble and Paris working on the interaction of intense femto-second laser fields with atoms, molecules, and clusters. From 2000 to 2003, he applied research and development and quality assurance for the deposition of thin solar thermal absorber layers at TiNOx, Munich, Germany. From 2003 until 2010, he was responsible for the development group of the plasma reactor deposition (PECVD) for silicon absorber films in the photovoltaic industry, with Oerlikon Solar, Trübbach, Switzerland. Since 2010, he has been with the HES-SO Valais-Wallis, Sion, Switzerland, and application of plasma for medical and material science and for treatment of surfaces.
From 1996 to 1999, he pursued fundamental research at the National Research Council Canada, Ottawa, ON, Canada, and the CEA in Grenoble and Paris working on the interaction of intense femto-second laser fields with atoms, molecules, and clusters. From 2000 to 2003, he applied research and development and quality assurance for the deposition of thin solar thermal absorber layers at TiNOx, Munich, Germany. From 2003 until 2010, he was responsible for the development group of the plasma reactor deposition (PECVD) for silicon absorber films in the photovoltaic industry, with Oerlikon Solar, Trübbach, Switzerland. Since 2010, he has been with the HES-SO Valais-Wallis, Sion, Switzerland, and application of plasma for medical and material science and for treatment of surfaces.