G. Androutsopoulos

Also published under:G. P. Androutsopoulos

Affiliation

Unaxis SPTec, Neuchatel, Switzerland

Topic

Amorphous Silicon,Back Contact,Flat Panel,Initial Efficiency,Mass Production,Production Equipment,Silicon Solar Cells,Solar Cells,Solar Panels,Substrate Area,Thin Films,Thin-film Solar Cells,Activity Of Samples,Air Mixture,Amorphous Cell,Annealing Temperature,Back Reflector,Bottom Cell,Catalyst Support,Catalytic Activity,Catalytic Materials,Catalytic Reaction,Cell Types,Chemical Reactions,Chemical Sensors,Direct Costs,Energy Dispersive X-ray,Energy-dispersive X-ray Spectroscopy,Gas Sensor Applications,Gas Sensors,H2 Oxidation,Heating Zone,Heavy Ions,High Performance,Homogeneous Deposition,Hydrogen Concentration,Hydrogenation Reaction,I-V Curves,Light Management,Low-pressure Chemical Vapor Deposition,Porous Layer,Porous Media,Porous Silicon,Presence Of Pd,Quantum Efficiency,Raman Spectroscopy,Reaction Temperature,Rutherford Backscattering,Saturation Time,Scanning Electron Microscopy,

Biography

George P. Androutsopoulos was born in Achaia, Greece, in 1946. He received the B.Sc. degree in chemistry from the Department of Chemistry, National University of Athens, Greece, in 1969. He received the M.Sc. (1974) and Ph.D. (1977) degrees in chemical engineering from the Department of Chemical Engineering, University of Manchester Institute of Science and Technology (UMIST), U.K.
He joined the Department of Chemical Engineering, National Technical University of Athens, in 1977 and he is an Associate Professor. His current research interests concern chemical reaction engineering application, e.g., catalytic oil fraction desulfurization kinetics, coal gasification kinetics and reactor design, gas absorption with chemical reaction, and ore structure investigation for material characterization.